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      • Growth of very large ingot diameter
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Home ›› Products ›› Czochralski (CZ) Process
Czochralski (CZ) Process
The FEMAG Czochralski software (FEMAG-CZ) is dedicated to the simulation of the Czochralski process (Cz, MCz, VCz, Kyropoulos).

 

The Czochralski process simulator is used to design new hotzones and recipes that matches specific business requirements, such as:

  • Growth of very large ingot diameter.
  • Defect free silicon ingot growth.
  • Process yield increase.
  • Oxygen content control.
  • Carbon content decrease.
  • Ingot radial and axial resistivity variance decrease.
  • CCZ process implementation.
  • Magnetic field implementation.
  • Sapphire growth process design.

FEMAG-CZ simulation software optimizes R&D expenses by limiting the number of prototypes and experiments.



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